橢偏儀在位表征電化學沉積的系統(tǒng)搭建（二十五）- 全波段沉積過程的準在位測試分析-介電常數(shù)

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橢偏儀在位表征電化學沉積的系統(tǒng)搭建（二十五）- 全波段沉積過程的準在位測試分析-介電常數(shù)

介電常數(shù)(从诲、)

圖4-7(a，c)是不同沉積時間介電常數(shù)實部e1隨波長變化圖靡羡，與折射率n的趨勢相似系洛。隨著時間的變化，值發(fā)生變化略步。當沉積時間為180s的時候描扯，在500-800nm長波范圍，其值從襯底的-20增加到-0.5趟薄，這也意味著新的物質(zhì)沉積绽诚，導(dǎo)致襯底的信息減少。在沉積時間增加到360s和540s時杭煎，整體上值比180s減小了3左右恩够，在350nm附近出現(xiàn)一個較明顯的波包，同時在550nm附近出現(xiàn)一個波包羡铲。當沉積時間增加到720s之后蜂桶，的值恢復(fù)到沉積180s附近，但是在500-800nm波段稍小也切，且在500nm附近出現(xiàn)波包屎飘。沉積時間為900s時，值的變化和720s一致贾费，但是出現(xiàn)的波包位置大概在530nm附近钦购。當時間為1080s時，在300-500nm波段其值和720s一樣褂萧，在長波段稍大押桃，且出現(xiàn)了500nm和600nm附近的兩個波包。從圖4-7(a导犹，c)可以看出隨著沉積的變化唱凯，沉積的CU₂O導(dǎo)致值在500-600nm的時候有額外的峰出現(xiàn)羡忘，且和吸收系數(shù)一樣存在紅移現(xiàn)象。

圖4-7(b磕昼，d)是不同沉積時間下測得的介電常數(shù)虛部卷雕，隨著時間的變化，值發(fā)生變化票从。當沉積時間為180s的時候漫雕，在500-800nm的長波范圍，其值大概從襯底的0增加到4峰鄙，同樣也意味著新的物質(zhì)沉積浸间，導(dǎo)致襯底的信息減少。在沉積時間增加到360s時吟榴，和180s比魁蒜，出現(xiàn)了兩個比較明顯的波包，大約在400nm和590nm附近吩翻。當沉積時間增加到540s之后兜看，的值隨著波長減小，在600nm到800nm波段接近0狭瞎，且在470nm和550nm附近出現(xiàn)了波包铣减。沉積時間為720s時，其變化和360s一致脚作，但是出現(xiàn)的波包位置大概在400nm和550nm附近且波包變得更大葫哗。當時間為900s時，在300-500nm波段其值和360s一樣球涛，在400nm劣针、500nm和600nm附近出現(xiàn)波包。時間為1080s時亿扁，變換趨勢和900s相同捺典，只是波包在400nm、530nm和680nm附近出現(xiàn)从祝。從圖4-7(b襟己，d)可以看出隨著沉積的變化，沉積的CU₂O導(dǎo)致值在540s的時候zui為特殊牍陌，可能是由于沉積厚度引起擎浴。同樣的，也使得在500nm-600nm波段有新的峰出現(xiàn)毒涧，它也歸因于沉積物的出現(xiàn)贮预。

圖4-7不同沉積時間得到的橢偏數(shù)據(jù)圖(a，c),(b，d)

圖4-8是相對于0s時不同沉積時間的改變Δ隨波長的變化圖仿吞』担可以看到相對于沒有沉積時，除了540s以外唤冈，其余的Δ在300到530±20nm波段為負值峡迷，在530±20到800nm波段為正值，且變化趨勢一致你虹。540s的Δ在整個波段除了580nm和660nm兩個點以外都是負值绘搞，但是在整體上的變化趨勢和其余時間大致一樣。說明隨著時間增加售葡，沉積表面對光的響應(yīng)一直在變化看杭，故而沉積的物相及表面粗糙度在變化忠藤。

圖4-8相對于0s時不同沉積時間的改變Δ隨波長的變化圖

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